Extreme Ultraviolet Generation Apparatus and Method for Application in Lithography Light Source

摘要

PURPOSE: An apparatus and a method for generating extreme ultraviolet for lithography light source are provided to generate high quality EUV(Extreme Ultra Violet) by using micro droplet having no clocking phenomenon. CONSTITUTION: Micro droplets are accelerated by a bead gun(120). The bead gun includes plural electrodes of ring type. The micro droplets pass through the electrodes. Laser beam is irradiated to the micro droplets discharged from the bead gun. EUV generated by colliding micro droplets with the laser is reflected with an angle to a curved mirror of a collector(150). [Reference numerals] (160) Control device; (AA) Collected EUV; (BB) Sold bead