METHOD FOR MANUFACTURING MICORO-STRUCTURE AND AN OPTICALLY PATTERNABLE SACRIFICIAL FILM-FORMING COMPOSITION

摘要

PURPOSE: A manufacturing method of a microstructure and an optically patterning type sacrificial film forming composition are provided to obtain optimal pattern profiles for forming a silicon-based material or metal film forming process under high temperatures. CONSTITUTION: A manufacturing method of a microstructure includes the following steps: a sacrificial film pattern(2) is formed; an inorganic material film is formed; and a space with the shape of the sacrificial film pattern is formed. The sacrificial film pattern forming process includes the following steps: a sacrificial film is formed using an optically patterning type sacrificial film forming composition; a substrate(1) is heated; the substrate is irradiated along a pattern layout image; a sacrificial film pattern is formed on the substrate; cross-linkage is formed between cresol novolak resins in the sacrificial film pattern.