| 摘要 |
Disclosed is a method for manufacturing a display device, wherein a conductive film is provided on a glass substrate without using a sputtering method. The method has: a chemical polishing step wherein an etching liquid is brought into contact with the surface of the glass substrate for the display device, and the arithmetic average roughness (Ra) of the glass surface is set at 0.7 nm-70 nm; and a film-forming step wherein a conductive polymer is applied to the glass surface that has been subjected to the chemical polishing step, and the conductive film having a resistivity of 400-1200 ?/sq is formed. The total light transmittance of the glass substrate after being subjected to the film-forming step is set at 87 % or more, said glass substrate having a thickness of 0.5 mm. |
