| 摘要 |
<p>PURPOSE: A thin film patterning apparatus is provided to reduce thin film damage formed on a substrate by supporting air sprayed from a compressor to a center unit of the substrate and to prevent deformation of the substrate. CONSTITUTION: A table(110) loads and unloads a substrate. A support transport unit(120) transfers the substrate. A laser unit(140) forms a pattern in a thin film. The laser unit is installed on the table which can straightly move. A compressor sprays air. A guide member is installed at one end portion of the table. The guide member guides the air sprayed from the compressor to the substrate side. A roller is formed on both sides of the guide member and supports an edge portion of the substrate.</p> |
