,申请号JP20090173204-传众专利搜索

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发明名称
摘要	<p>The invention relates an ion source for ion beam deposition comprising multiple anodes, wherein the ion source deposits multiple zones of a source material and thicknesses of at least two of the multiple zones are different.</p>
申请公布号	JP5084795(B2)	申请公布日期	2012.11.28
申请号	JP20090173204	申请日期	2009.07.24
申请人		发明人
分类号	G11B5/84;C23C14/06;C23C14/32;G11B5/72;H01J27/08;H01J37/08	主分类号	G11B5/84
代理机构		代理人
主权项
地址

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