发明名称 GROUP-III NITRIDE SEMICONDUCTOR LASER ELEMENT AND METHOD OF MANUFACTURING GROUP-III NITRIDE SEMICONDUCTOR LASER ELEMENT
摘要 <p>Provided is a group-III nitride semiconductor laser device with a laser cavity enabling a low threshold current, on a semipolar surface of a support base the c-axis of a hexagonal group-III nitride of which tilts toward the m-axis. In a laser structure 13, a first surface 13a is a surface opposite to a second surface 13b and first and second fractured faces 27, 29 extend each from an edge 13c of the first surface 13a to an edge 13d of the second surface 13b. A scribed mark SM1 extending from the edge 13c to the edge 13d is made, for example, at one end of the first fractured face 27, and the scribed mark SM1 or the like has a depressed shape extending from the edge 13c to the edge 13d. The fractured faces 27, 29 are not formed by dry etching and thus are different from the conventional cleaved facets such as c-planes, m-planes, or a-planes. It is feasible to use emission of a band transition enabling a low threshold current.</p>
申请公布号 EP2528175(A1) 申请公布日期 2012.11.28
申请号 EP20100843111 申请日期 2010.11.16
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 TAKAGI SHIMPEI;YOSHIZUMI YUSUKE;KATAYAMA KOJI;UENO MASAKI;IKEGAMI TAKATOSHI
分类号 H01S5/343 主分类号 H01S5/343
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