发明名称 Ceiling electrode with process gas dispersers housing plural inductive RF power applicators extending into the plasma
摘要 A gas distribution plate is formed of a metallic body having a bottom surface with plural gas disperser orifices and an internal gas manifold feeding the orifices. Each one of an array of discrete RF power applicators held in the plate includes (a) an insulating cylindrical housing extending through the plate, a portion of the housing extending outside of the plate through the bottom surface, and (b) a conductive solenoidal coil contained within the housing, a portion of the coil lying within the portion of the housing that extends outside of the plate through the bottom surface.
申请公布号 US8317970(B2) 申请公布日期 2012.11.27
申请号 US20080132133 申请日期 2008.06.03
申请人 LAI CANFENG;PANG LILY L.;FOAD MAJEED A.;APPLIED MATERIALS, INC. 发明人 LAI CANFENG;PANG LILY L.;FOAD MAJEED A.
分类号 C23C16/00;H01L21/306 主分类号 C23C16/00
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