发明名称 Device including nonvolatile memory element
摘要 A device including a novel nonvolatile memory element is provided. A device including a nonvolatile memory element in which an oxide semiconductor is used as a semiconductor material for a channel formation region. The nonvolatile memory element includes a control gate, a charge accumulation layer which overlaps with the control gate with a first insulating film provided therebetween, and an oxide semiconductor layer formed using an oxide semiconductor material, which overlaps with the charge accumulation layer with a second insulating film provided therebetween.
申请公布号 US8319267(B2) 申请公布日期 2012.11.27
申请号 US20100943532 申请日期 2010.11.10
申请人 KATO KIYOSHI;IEDA YOSHINORI;KOYAMA JUN;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 KATO KIYOSHI;IEDA YOSHINORI;KOYAMA JUN
分类号 H01L29/788 主分类号 H01L29/788
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