发明名称 Non-volatile semiconductor memory devices having charge trap layers between word lines and active regions thereof
摘要 A non-volatile memory device includes: word line disposed on a substrate; an active region crossing over the word line; and a charge trap layer that is between the word line and the active region.
申请公布号 US8319276(B2) 申请公布日期 2012.11.27
申请号 US20100712366 申请日期 2010.02.25
申请人 NAKANISHI TOSHIRO;PARK CHANJIN;CHOI SIYOUNG;KOO BONYOUNG;SAMSUNG ELECTRONICS CO., LTD. 发明人 NAKANISHI TOSHIRO;PARK CHANJIN;CHOI SIYOUNG;KOO BONYOUNG
分类号 H01L29/792 主分类号 H01L29/792
代理机构 代理人
主权项
地址