发明名称 |
Gas injection unit and thin film deposition apparatus having the same |
摘要 |
A gas injection unit and a thin film deposition apparatus having the gas injection unit are provided. Since a variety of different kinds of organic materials can be sequentially vaporized and injected by a single injection unit, a variety of different kinds of thin films can be deposited in a single chamber. Furthermore, the gas injection structure of the injector unit can be easily controlled. Therefore, even when the process conditions such as the size of the substrate, the process temperature of the chamber, and the like are altered, it becomes possible to actively response to the altered process conditions by simply replacing some parts without replacing the whole injector unit. |
申请公布号 |
US8317922(B2) |
申请公布日期 |
2012.11.27 |
申请号 |
US20080344486 |
申请日期 |
2008.12.27 |
申请人 |
LEE CHANG JAE;KWON YOUNG-HO;JUSUNG ENGNINEERING CO., LTD. |
发明人 |
LEE CHANG JAE;KWON YOUNG-HO |
分类号 |
C23C16/455;C23C16/06;C23C16/22;C23C16/448;C23F1/00;H01L21/306 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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