发明名称 |
Determining a repairing form of a defect at or close to an edge of a substrate of a photo mask |
摘要 |
Determining a repairing form of a defect at or close to an edge of a substrate. The defect may be scanned with a scanning probe microscope to determine a three-dimensional contour of the defect. The defect may be scanned with a scanning particle microscope to determine the shape of the at least one edge of the substrate. The repairing form of the defect may be determined from a combination of the three-dimensional contour and the shape of the at least one edge.
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申请公布号 |
US8316698(B2) |
申请公布日期 |
2012.11.27 |
申请号 |
US20090640853 |
申请日期 |
2009.12.17 |
申请人 |
BUDACH MICHAEL;NAWOTEC GMBH |
发明人 |
BUDACH MICHAEL |
分类号 |
G01B5/28;G03F1/00 |
主分类号 |
G01B5/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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