发明名称 Determining a repairing form of a defect at or close to an edge of a substrate of a photo mask
摘要 Determining a repairing form of a defect at or close to an edge of a substrate. The defect may be scanned with a scanning probe microscope to determine a three-dimensional contour of the defect. The defect may be scanned with a scanning particle microscope to determine the shape of the at least one edge of the substrate. The repairing form of the defect may be determined from a combination of the three-dimensional contour and the shape of the at least one edge.
申请公布号 US8316698(B2) 申请公布日期 2012.11.27
申请号 US20090640853 申请日期 2009.12.17
申请人 BUDACH MICHAEL;NAWOTEC GMBH 发明人 BUDACH MICHAEL
分类号 G01B5/28;G03F1/00 主分类号 G01B5/28
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