发明名称 Exposure apparatus and device fabrication method
摘要 The present invention provides an apparatus including a calculating unit which calculates a first time serving as a time required to drive a stage in a non-scanning direction perpendicular to a scanning direction, and a second time serving as a time required to drive the stage in the scanning direction, both of which range from when exposure of one of the plurality of shot regions ends until exposure of the next shot region starts, and an adjusting unit which adjusts, when the first time is longer than the second time, one of a time for which an acceleration of the stage nonlinearly changes in the process of reversing the scanning direction, and a settling time taken for the stage to settle from when acceleration of the stage ends until exposure starts, so that the second time becomes longer than the first time in driving the stage in the scanning direction.
申请公布号 US8319942(B2) 申请公布日期 2012.11.27
申请号 US20090553703 申请日期 2009.09.03
申请人 TAKANO SHIN;MATSUMOTO HIDEKI;OMAMEUDA YOSHIHIRO;CANON KABUSHIKI KAISHA 发明人 TAKANO SHIN;MATSUMOTO HIDEKI;OMAMEUDA YOSHIHIRO
分类号 G03B27/42;G03B27/58 主分类号 G03B27/42
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