发明名称 Microresistivity imaging at multiple depths of investigation
摘要 A microresistivity logging tool includes a dual function electrode deployed between a guard electrode and a return electrode. A drive circuit enables the electrical potential of the dual function electrode to be independently controlled so as to control a depth of investigation of a microresistivity measurement. The depth of investigation tends to increase with increasing electrical potential of the dual function electrode.
申请公布号 US8319498(B2) 申请公布日期 2012.11.27
申请号 US20090581237 申请日期 2009.10.19
申请人 WANG TSILI;SCHLUMBERGER TECHNOLOGY CORPORATION 发明人 WANG TSILI
分类号 G01V3/00 主分类号 G01V3/00
代理机构 代理人
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