| 摘要 |
An exposure apparatus EX is provided with a projection optical system PL, and the projection optical system PL includes a first optical element LS1 disposed most closely to an image plane of the projection optical system PL. The exposure apparatus EX includes a first liquid immersion mechanism 1 which forms a first liquid immersion area LR1 of a first liquid LQ1 between the first optical element LS1 and an upper surface 65 of a transparent member 64 provided on a side of the image plane of the projection optical system PL, and an observation unit 60 which observes a state of the first liquid immersion area LR1. It is possible to grasp the state of the liquid immersion area of the liquid, thereby executing optimum liquid immersion exposure. |
