| 摘要 |
<p>PURPOSE: An apparatus for stripping a device from a substrate using a roll to roll method is provided to etch and strip a sacrificial layer in a single process while successively processes substrates using the roll to roll method. CONSTITUTION: A supply roll(110) supplies a stripped object(111) to an etching part(120). The stripped object comprises a substrate(113), a plurality of devices(119), and a sacrificial layer(115). The etching part etches the sacrificial layer by receiving the stripped object from the supply roll. A stripping part(130) stripes the device by receiving the substrate in which the sacrificial layer is etched. A collecting roll(140) collects the substrate in which the device is stripped. The supply roll and the collecting roll successively process the substrate using a roll to roll method. [Reference numerals] (AA) Etching gas</p> |
