发明名称 IMPRINT APPARATUS, IMPRINT METHOD, AND DEVICE MANUFACTURING METHOD
摘要 An imprint apparatus, which is configured to transfer a pattern to an imprint material supplied on a substrate by using a mold having the pattern formed thereon, includes a light-receiving element, a detection system configured to illuminate a mark formed on the substrate and a mark formed on the mold, and guide light reflected from the mark formed on the substrate and the mark formed on the mold to the light-receiving element, and a relay optical system. The relay optical system is configured to form images of the light reflected from the mark formed on the substrate and the mark formed on the mold between the relay optical system and the detection system. The detection system is configured to guide the light image-formed by the relay optical system to the light-receiving element.
申请公布号 US2012292801(A1) 申请公布日期 2012.11.22
申请号 US201213469829 申请日期 2012.05.11
申请人 MAEDA HIRONORI;MIURA SEIYA;MISHIMA KAZUHIKO;MINODA KEN;CANON KABUSHIKI KAISHA 发明人 MAEDA HIRONORI;MIURA SEIYA;MISHIMA KAZUHIKO;MINODA KEN
分类号 B29C59/02 主分类号 B29C59/02
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