| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a washing treatment method which washes an upper surface and a periphery of a cup without providing a special washing mechanism. <P>SOLUTION: An upper end of a process cup 40 enclosing a periphery of the spin base 21 is placed lower than a holding surface 21a of the spin base 21 and a cleaning liquid is supplied from a discharge head 31 to the holding surface 21a while the spin base 21 is being rotated at a speed ranging from 250 rpm to 350 rpm (a first rotation number). Then, an outer side upper surface 43d of the process cup 40 is washed with the cleaning liquid dispersed from the holding surface 21a of the rotating spin base 21. Then, the cleaning liquid is supplied from the discharge head 31 to the holding surface 21a and a partition plate 15 and a side wall 11 of a chamber 10, which are located on the outer side of the process cup 40, are washed with the cleaning liquid dispersed from the rotating holding surface 21a while the spin base 21 is being rotated at a speed ranging from 350 rpm to 450 rpm (a second rotation number), which is larger than the first rotation number. <P>COPYRIGHT: (C)2013,JPO&INPIT |
