| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of cleaning a substrate such as a mask blank substrate, capable of, when cleaning the mask blank substrate, preventing the occurrence of latent damage inside a glass substrate, and securely removing particles existing on a substrate principal surface. <P>SOLUTION: A method of cleaning a substrate includes injecting a pressurized cleaning liquid including air bubbles or cleaning particles from an injection nozzle to at least one surface of a substrate disposed in a liquid to clean the at least one surface of the substrate. <P>COPYRIGHT: (C)2013,JPO&INPIT |
