| 摘要 |
An optical position-measuring device includes a measuring standard and a scanning unit. The measuring standard includes an incremental graduation and at least one reference marking at a reference position. The reference marking has two reference-marking subfields disposed in mirror symmetry relative to a reference-marking axis of symmetry, each of the subfields including a grating structure having a locally changeable graduation period. The scanning unit includes a divergently emitting light source, one or more gratings, and a reference-signal detector system. The reference-signal detector system has at least four detector arrays formed and positioned such that, from the scanning of the reference marking via the reference-signal detector system, first and second pairs of partial reference signals result, in each case having a signal pattern in phase opposition. The first pair of partial reference signals is offset by an offset amount relative to the second pair of partial reference signals. |
