| 摘要 |
<P>PROBLEM TO BE SOLVED: To properly calibrate a temperature of a heat treatment mechanism by a simple method in a heat treatment apparatus for heat-treating a substrate to a prescribed temperature using the heat treatment mechanism. <P>SOLUTION: A temperature inspection fixture 10 of the temperature calibration device includes: a wafer 70 to be treated which is placed on a heat treatment plate; and a plurality of Wheatstone bridge circuits 71 provided on the wafer 70 to be treated. Each of the Wheatstone bridge circuits 71 includes: four temperature measuring resistors 72 having resistance values changing according to a temperature change and four contact pads 73 with which contact pieces 41 are brought into contact. A control section of the temperature calibration device adjusts a temperature of the heat treatment plate so that the Wheatstone bridge circuits 71 become equilibrium states, that is, offset voltage of the Wheatstone bridge circuits 71 become zero. <P>COPYRIGHT: (C)2013,JPO&INPIT |
