| 摘要 |
A drawing apparatus includes an aperture array, a lens array configured to form a plurality of crossovers of a plurality of charged particle beams from the aperture array, and a projection system including an element having a single aperture and configured to converge the plurality of charged particle beams corresponding to the plurality of crossovers and to project the plurality of charged particle beams having passed through the single aperture onto the substrate. The lens array includes a correction lens array including a converging lens eccentric relative to corresponding one of a plurality of apertures of the aperture array such that the plurality of charged particle beams converged according to aberration of the projection system are converged to the single aperture. The lens array includes a magnifying lens array configured, so as to form the plurality of crossovers, to magnify a plurality of crossovers formed by the correction lens array.
|
