METHOD FOR SPLITTING A PATTERN FOR USE IN A MULTI-BEAMLET LITHOGRAPHY APPARATUS
摘要
<p>The invention relates to a method for splitting a pattern for use in a multi-beamlet lithography apparatus. The method comprises providing an input pattern to be exposed onto a target surface by means of a plurality of beamlets of the multi-beamlet lithography apparatus. Within the input pattern first and second regions are identified. A first region is a region that is exclusively exposable by a single beamlet of the plurality of beamlets. A second region is a region that is exposable by more than one beamlet of the plurality of beamlets. On the basis of an assessment of the first and second regions it is determined what portion of the pattern is to be exposed by each beamlet.</p>
申请公布号
WO2012156510(A1)
申请公布日期
2012.11.22
申请号
WO2012EP59269
申请日期
2012.05.18
申请人
MAPPER LITHOGRAPHY IP B.V.;WIELAND, MARCO JAN-JACO;VAN NIEUWSTADT, JORIS ANNE HENRI;VAN DE PEUT, TEUNIS
发明人
WIELAND, MARCO JAN-JACO;VAN NIEUWSTADT, JORIS ANNE HENRI;VAN DE PEUT, TEUNIS