<p>Deposition of silicon oxide films at low temperature by using wet chemistry techniques. The wet chemistry solution may be a mixture of sodium hypochloride (NaOCl), tetra methyl ammonium hydroxide (TMAH) and hydrated silicate, such as silicic acid. The resulting silicon oxide films provide excellent anti-reflective coatings for solar cells and the like.</p>
申请公布号
WO2012141908(A8)
申请公布日期
2012.11.22
申请号
WO2012US31122
申请日期
2012.03.29
申请人
ASIA UNION ELECTRONIC CHEMICAL CORPORATION;DOVE, CURTIS;SINGH, BALJIT;TESNADO, EDUARD, GIL PARAN;BALOOCH, MEHDI
发明人
DOVE, CURTIS;SINGH, BALJIT;TESNADO, EDUARD, GIL PARAN;BALOOCH, MEHDI