| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern formation method capable of easily forming a fine pattern, and a pattern formation device and a template manufacturing method. <P>SOLUTION: A pattern formation method according to an embodiment comprises the steps of: forming a heat-shrinkable first film 101 on a base material 100; patterning the first film 101; and heating and shrinking the patterned first film 101. Heating is performed until the first film 101 is shrunk to a desired dimension (until the first film 101 is turned to a target pattern shape). The volume of the first film 101 does not change through shrinking. Thus, while the area of the cross section (the surface parallel to the base material 100) of the first film 101 decreases by shrinkage, its thickness increases. In other words, the pitch of the pattern formed by the first film 101 reduces and the aspect ratio increases. <P>COPYRIGHT: (C)2013,JPO&INPIT |
