APPARATUS AND METHOD FOR TREATING A SUBSTANCE AT A SUBSTRATE

摘要

An apparatus is disclosed for treating a substance (2a, 2b, 2c) at a substrate (2), the substance having an electrical resistance. The apparatus comprises a first irradiation facility (4) that is arranged for heating the substance by irradiating the substance with infrared, visible and/or UV-radiation that is absorbed by the substance. Said heating by absorption causes a reduction of the electrical resistance of the substance with a first reduction factor greater than 1. The apparatus further comprises a second irradiation facility (8) that is arranged for subsequently resistively heating the irradiated substance by exposure to micro-wave radiation to further reduce the electrical resistance of the substance with a second reduction factor greater than 1.