摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of smoothing a surface of a substrate which has a recessed defect such as a pit or a scratch. <P>SOLUTION: The method of smoothing a surface of a glass substrate is a method of smoothing the surface of a glass substrate employed for a reflective mask blank for EUV lithography and is characterized by: a step of forming a thin film on a glass substrate; a step of detecting a recessed defect present on the glass substrate; and a step of locally heating the portion of the thin film present directly on the detected recessed defect or locally anodizing the portion of the thin film to cause a chemical reaction which involves a volume increase in the material that composes the thin film. <P>COPYRIGHT: (C)2008,JPO&INPIT |