| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide EUV light source equipment capable of easily detecting deterioration in the window of an EUV light generation chamber. <P>SOLUTION: The EUV light source equipment comprises: a driver laser 1; an EUV light generation chamber 2; a window 6 for transmitting laser beams into the EUV light generation chamber 2; an EUV light condensation mirror 8; a laser beam condensation optical system 4 for condensing laser beams on the track of a target substance; a temperature sensor 82 for detecting the temperature of the window 6; and a laser beam optical system deterioration check processing section 80 for determining the deterioration of the window 6, based on the temperature of the window 6 detected by the temperature sensor 82, when extreme ultraviolet rays are generated. <P>COPYRIGHT: (C)2008,JPO&INPIT |
