发明名称 |
Array substrate and manufacturing method thereof |
摘要 |
The disclosed technology provides an array substrate and a method of manufacturing the array substrate. An embodiment of the method comprises: a first mask process of forming an inorganic material protrusion on a base substrate; a second mask process of forming a reflective region pattern, a gate line, a gate electrode branched from the gate line, and a common electrode; a third mask process of forming an active island and a data line formed and forming a source electrode connected to the data line and a drain electrode on the active island and a channel; a fourth mask process of forming an insulation material layer, treating the insulation material layer to form a planarization layer, and forming a through hole above the drain electrode; and a fifth mask process of forming a pixel electrode and connected to the drain electrode via the through hole in a reflective region. |
申请公布号 |
EP2525255(A1) |
申请公布日期 |
2012.11.21 |
申请号 |
EP20120168555 |
申请日期 |
2012.05.18 |
申请人 |
BOE TECHNOLOGY GROUP CO., LTD. |
发明人 |
SONG, YOUNGSUK;CHOI, SEUNGJIN;YOO, SEONGYEOL |
分类号 |
G02F1/1362 |
主分类号 |
G02F1/1362 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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