发明名称 Array substrate and manufacturing method thereof
摘要 The disclosed technology provides an array substrate and a method of manufacturing the array substrate. An embodiment of the method comprises: a first mask process of forming an inorganic material protrusion on a base substrate; a second mask process of forming a reflective region pattern, a gate line, a gate electrode branched from the gate line, and a common electrode; a third mask process of forming an active island and a data line formed and forming a source electrode connected to the data line and a drain electrode on the active island and a channel; a fourth mask process of forming an insulation material layer, treating the insulation material layer to form a planarization layer, and forming a through hole above the drain electrode; and a fifth mask process of forming a pixel electrode and connected to the drain electrode via the through hole in a reflective region.
申请公布号 EP2525255(A1) 申请公布日期 2012.11.21
申请号 EP20120168555 申请日期 2012.05.18
申请人 BOE TECHNOLOGY GROUP CO., LTD. 发明人 SONG, YOUNGSUK;CHOI, SEUNGJIN;YOO, SEONGYEOL
分类号 G02F1/1362 主分类号 G02F1/1362
代理机构 代理人
主权项
地址