Method for manufacturing an electromechanical structure comprising at least one mechanical reinforcement post

摘要

The method involves forming well regions defining mechanical reinforcement pillars, by etching a sacrificial layer (2) that covers a monocrystalline layer (1). A functionalization layer (31) made of a material e.g. silicon nitride, doped/insulated polycrystalline silicon, metal or polymer, is deposited. A filling layer (32) is deposited to terminate filling of the regions, where the layer (32) partially covers the layer (31) and is made of another material e.g. silica. The layer (32) is planarized, and the pillars are formed by superimposition of the materials in the regions. The monocrystalline layer is made of monocrystalline material e.g. silicon, germanium, quartz or perovskite. An independent claim is also included for an electro-mechanical structure comprising a substrate.