发明名称 |
Strain matching of crystals and horizontally-spaced monochromator and analyzer crystal arrays in diffraction enhanced imaging systems and related methods |
摘要 |
Strain matching of crystals and horizontally-spaced monochromator and analyzer crystal arrays in diffraction enhanced imaging systems and related methods are disclosed. A DEI system, including strain matched crystals can comprise an X-ray source configured to generate a first X-ray beam. A first monochromator crystal can be positioned to intercept the first X-ray beam for producing a second X-ray beam. A second monochromator crystal can be positioned to intercept the second X-ray beam to produce a third X-ray beam for transmission through an object. The second monochromator crystal has a thickness selected such that a mechanical strain on a side of the first monochromator crystal is the same as a mechanical strain on the second monochromator crystal. An analyzer crystal has a thickness selected such that a mechanical strain on a side of the first monochromator crystal is the same as a mechanical strain on the analyzer crystal. |
申请公布号 |
US8315358(B2) |
申请公布日期 |
2012.11.20 |
申请号 |
US20100793228 |
申请日期 |
2010.06.03 |
申请人 |
CONNOR DEAN;ZHONG ZHONG;PARHAM CHRISTOPHER;PISANO ETTA;NEXTRAY, INC. |
发明人 |
CONNOR DEAN;ZHONG ZHONG;PARHAM CHRISTOPHER;PISANO ETTA |
分类号 |
G21K1/06 |
主分类号 |
G21K1/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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