发明名称 Strain matching of crystals and horizontally-spaced monochromator and analyzer crystal arrays in diffraction enhanced imaging systems and related methods
摘要 Strain matching of crystals and horizontally-spaced monochromator and analyzer crystal arrays in diffraction enhanced imaging systems and related methods are disclosed. A DEI system, including strain matched crystals can comprise an X-ray source configured to generate a first X-ray beam. A first monochromator crystal can be positioned to intercept the first X-ray beam for producing a second X-ray beam. A second monochromator crystal can be positioned to intercept the second X-ray beam to produce a third X-ray beam for transmission through an object. The second monochromator crystal has a thickness selected such that a mechanical strain on a side of the first monochromator crystal is the same as a mechanical strain on the second monochromator crystal. An analyzer crystal has a thickness selected such that a mechanical strain on a side of the first monochromator crystal is the same as a mechanical strain on the analyzer crystal.
申请公布号 US8315358(B2) 申请公布日期 2012.11.20
申请号 US20100793228 申请日期 2010.06.03
申请人 CONNOR DEAN;ZHONG ZHONG;PARHAM CHRISTOPHER;PISANO ETTA;NEXTRAY, INC. 发明人 CONNOR DEAN;ZHONG ZHONG;PARHAM CHRISTOPHER;PISANO ETTA
分类号 G21K1/06 主分类号 G21K1/06
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