发明名称 Surface depressions for die-to-die interconnects and associated systems
摘要 Stacked microelectronic dies employing die-to-die interconnects and associated systems and methods are disclosed herein. In one embodiment, a stacked system of microelectronic dies includes a first microelectronic die, a second microelectronic die attached to the first die, and a die-to-die interconnect electrically coupling the first die with the second die. The first die includes a back-side surface, a surface depression in the back-side surface, and a first metal contact located within the surface depression. The second die includes a front-side surface and a second metal contact located at the front-side surface and aligned with the first metal contact of the first die. The die-to-die interconnect electrically couples the first metal contact of the first die with the second metal contact of the second die and includes a flowable metal layer that at least partially fills the surface depression of the first die.
申请公布号 US8314497(B2) 申请公布日期 2012.11.20
申请号 US20100874076 申请日期 2010.09.01
申请人 PRATT DAVID S.;MICRON TECHNOLOGY, INC. 发明人 PRATT DAVID S.
分类号 H01L23/52;H01L23/544 主分类号 H01L23/52
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