发明名称 |
Antireflective coating composition, antireflective coating, and patterning process |
摘要 |
A composition comprising (A) a fluorinated polymer having k=0.01-0.4 and n=1.4-2.1 and (B) an aromatic ring-bearing polymer having k=0.3-1.2 is used to form an antireflective coating. The ARC-forming composition can be deposited by the same process as prior art ARCs. The resulting ARC is effective in preventing reflection of exposure light in photolithography and has an acceptable dry etching rate. |
申请公布号 |
US8313890(B2) |
申请公布日期 |
2012.11.20 |
申请号 |
US20090636546 |
申请日期 |
2009.12.11 |
申请人 |
TACHIBANA SEIICHIRO;NODA KAZUMI;WATANABE TAKERU;HATAKEYAMA JUN;KINSHO TAKESHI;SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
TACHIBANA SEIICHIRO;NODA KAZUMI;WATANABE TAKERU;HATAKEYAMA JUN;KINSHO TAKESHI |
分类号 |
G03F7/11;C08L31/02;G03F7/40 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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