发明名称 Non-volatile memory devices
摘要 Non-volatile memory devices are provided including a control gate electrode on a substrate; a charge storage insulation layer between the control gate electrode and the substrate; a tunnel insulation layer between the charge storage insulation layer and the substrate; a blocking insulation layer between the charge storage insulation layer and the control gate electrode; and a material layer between the tunnel insulation layer and the blocking insulation layer, the material layer having an energy level constituting a bottom of a potential well.
申请公布号 US8314457(B2) 申请公布日期 2012.11.20
申请号 US201113095408 申请日期 2011.04.27
申请人 KIM HYUN-SUK;SHIM SUN-IL;KANG CHANG-SEOK;JEONG WON-CHEOL;CHOI JUNG-DAL;PARK JAE-KWAN;LIM SEUNG-HYUN;KIM SUN-JUNG;SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM HYUN-SUK;SHIM SUN-IL;KANG CHANG-SEOK;JEONG WON-CHEOL;CHOI JUNG-DAL;PARK JAE-KWAN;LIM SEUNG-HYUN;KIM SUN-JUNG
分类号 H01L29/66 主分类号 H01L29/66
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