| 摘要 |
PURPOSE: A linear source device with a limited injection angle of materials is provided to minimize shadow effect in an SMS(Small Mask Scanning) deposition process applied to a large substrate. CONSTITUTION: A linear source device with a limited injection angle of materials comprises a linear source(100) with a plurality of material injection holes arranged at regular intervals, a shield grid(200) which is formed with partitions isolating material flux injected from each material injection hole and is arranged at the top of the linear source, and an angle limiting block(300) which has square openings for letting material flux through and frames between the square openings for cutting off material flux. [Reference numerals] (100) Linear source; (200) Shield grid; (300) Angle limiting block; (400) Compensating plate
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