VOLTAGE NON-UNIFORMITY COMPENSATION METHOD FOR HIGH FREQUENCY PLASMA REACTOR FOR THE TREATMENT OF RECTANGULAR LARGE AREA SUBSTRATES,申请号KR20067005300-传众专利搜索

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发明名称	VOLTAGE NON-UNIFORMITY COMPENSATION METHOD FOR HIGH FREQUENCY PLASMA REACTOR FOR THE TREATMENT OF RECTANGULAR LARGE AREA SUBSTRATES
摘要
申请公布号	KR101202151(B1)	申请公布日期	2012.11.15
申请号	KR20067005300	申请日期	2004.09.08
申请人		发明人
分类号	H01L21/205;C23C16/00;H01J37/32	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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