| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target which is an Al-based target and is free from cracking when it is formed even if it has a high content of Cr exhibiting more excellent corrosion resistance and further which is also free from cracking during sputtering, and to provide a method for producing the sputtering target. <P>SOLUTION: In the sputtering target, Al-enriched particles having an absolute maximum length within the range of 0.1-50 μm are dispersed in a base material having a composition containing, by atomic percentage, 5-20% of Si and 5.5-25% of Cr, with the remainder composed of Al and inevitable impurities. <P>COPYRIGHT: (C)2013,JPO&INPIT |
