| 摘要 |
<P>PROBLEM TO BE SOLVED: To increase the number of workpieces to be loaded in an apparatus at a time without causing an increase in size of the apparatus itself. <P>SOLUTION: A mechanism B for moving a workpiece for a vapor deposition apparatus moves a plurality of workpieces P along a constant revolution path including positions where vapor deposition is performed by targets 20, 21, while rotating each of the workpieces P. The mechanism holds adjacent workpieces P, P so that rotational regions thereof overlap each other while not interfering with each other, and moves workpieces P, P along the revolution path while rotating reversely to each other. <P>COPYRIGHT: (C)2013,JPO&INPIT |
