发明名称 METHOD FOR FABRICATING A DRAM CAPACITOR HAVING INCREASED THERMAL AND CHEMICAL STABILITY
摘要 A method for fabricating a dynamic random access memory (DRAM) capacitor includes forming a first electrode film. The first electrode film comprises a conductive binary metal compound and a dopant. The dopant may have a uniform or non-uniform concentration within the first electrode film. A high-k dielectric film is formed over the first electrode film. A second electrode film is formed over the dielectric film. The second electrode film comprises a conductive binary metal compound and a dopant. The dopant may have a uniform or non-uniform concentration within the second electrode film. The dopants and their distribution are chosen so that the crystal structure of the surface of the electrode is not degraded if the electrode is to be used as a templating structure for subsequent layer formation. Additionally, the dopants and their distribution are chosen so that the work function of the electrodes is not degraded.
申请公布号 US2012287553(A1) 申请公布日期 2012.11.15
申请号 US201113107081 申请日期 2011.05.13
申请人 RAMANI KARTHIK;DEWEERD WIM;ODE HIROYUKI;INTERMOLECULAR, INC. 发明人 RAMANI KARTHIK;DEWEERD WIM;ODE HIROYUKI
分类号 H01G4/30;H01G7/00 主分类号 H01G4/30
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