METHOD AND APPARATUS FOR PRODUCING FLUORINE-CONTAINING ORGANOSILICON COMPOUND THIN FILM

摘要

The purpose of the present invention is to provide a production method and a production apparatus by which a fluorine-containing organosilicon compound thin film having high durability can be produced and wherein a film formation step can be continuously carried out. Provided are: a method for producing a fluorine-containing organosilicon compound thin film, which is characterized by comprising the steps (a)-(c) described below sequentially in this order; and a production apparatus which is suitable for the method for producing a fluorine-containing organosilicon compound thin film. (a) a heating step in which a fluorine-containing organosilicon compound within a heating container is heated to the deposition initiation temperature (b) a pretreatment step in which vapor from the fluorine-containing organosilicon compound is discharged after reaching the deposition initiation temperature (c) a film formation step in which a fluorine-containing organosilicon compound thin film is formed on a substrate within a vacuum chamber by supplying the pretreated vapor of the fluorine-containing organosilicon compound onto the substrate