发明名称 PATTERN FORMING METHOD USING PHOTOSENSITIVE RESIN COMPOSITION, PATTERN, COLOR FILTER, AND IMAGE DISPLAY DEVICE
摘要 <p>A pattern forming method using a photosensitive resin composition has the following steps to be performed in the following order: a step for laminating a substrate with a photosensitive resin transfer material; a step for exposing an image and removing a temporary support, performed in this or the reverse order; and a step for using a first type of treatment liquid for the removal of the thermoplastic resin layer, and the removal of the unexposed sections in the photosensitive resin composition layer after exposure, when the photosensitive resin composition is of the negative type, or a step for using the first type of treatment liquid for the removal of the thermoplastic resin layer, and the removal of the exposed sections in the photosensitive resin composition layer after exposure, when the photosensitive resin composition is of the positive type.</p>
申请公布号 WO2012153777(A1) 申请公布日期 2012.11.15
申请号 WO2012JP61910 申请日期 2012.05.09
申请人 FUJIFILM CORPORATION;TAKEUCHI, KOU 发明人 TAKEUCHI, KOU
分类号 G03F7/32;G02B5/20;G02F1/1335;G02F1/1339;G03F7/004;G03F7/038;G03F7/11 主分类号 G03F7/32
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