发明名称 |
PATTERN FORMING METHOD USING PHOTOSENSITIVE RESIN COMPOSITION, PATTERN, COLOR FILTER, AND IMAGE DISPLAY DEVICE |
摘要 |
<p>A pattern forming method using a photosensitive resin composition has the following steps to be performed in the following order: a step for laminating a substrate with a photosensitive resin transfer material; a step for exposing an image and removing a temporary support, performed in this or the reverse order; and a step for using a first type of treatment liquid for the removal of the thermoplastic resin layer, and the removal of the unexposed sections in the photosensitive resin composition layer after exposure, when the photosensitive resin composition is of the negative type, or a step for using the first type of treatment liquid for the removal of the thermoplastic resin layer, and the removal of the exposed sections in the photosensitive resin composition layer after exposure, when the photosensitive resin composition is of the positive type.</p> |
申请公布号 |
WO2012153777(A1) |
申请公布日期 |
2012.11.15 |
申请号 |
WO2012JP61910 |
申请日期 |
2012.05.09 |
申请人 |
FUJIFILM CORPORATION;TAKEUCHI, KOU |
发明人 |
TAKEUCHI, KOU |
分类号 |
G03F7/32;G02B5/20;G02F1/1335;G02F1/1339;G03F7/004;G03F7/038;G03F7/11 |
主分类号 |
G03F7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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