发明名称 |
CHARGED PARTICLE BEAM SYSTEMS, PARTICULARLY MASS FILTER FOR ION BEAM SYSTEM AND WIDE APERTURE WIEN E×B MASS FILTER |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a wide aperture Wien E×B mass filter for use in a focused ion beam system. <P>SOLUTION: An E×B Wien mass filter provides an independently-adjustable electric field combined with an electric dipole field required for mass separation. The independently adjustable electric field can provide a larger optical aperture, and be used to correct astigmatism and to deflect the beam in a direction parallel and/or perpendicular to a magnetic field. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012227140(A) |
申请公布日期 |
2012.11.15 |
申请号 |
JP20120088766 |
申请日期 |
2012.04.09 |
申请人 |
FEI CO |
发明人 |
DAVID TUGGLE;N WILLIAM PARKER |
分类号 |
H01J37/05;H01J37/153;H01J37/317;H01J49/10;H01J49/48 |
主分类号 |
H01J37/05 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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