发明名称 CHARGED PARTICLE BEAM SYSTEMS, PARTICULARLY MASS FILTER FOR ION BEAM SYSTEM AND WIDE APERTURE WIEN E×B MASS FILTER
摘要 <P>PROBLEM TO BE SOLVED: To provide a wide aperture Wien E&times;B mass filter for use in a focused ion beam system. <P>SOLUTION: An E&times;B Wien mass filter provides an independently-adjustable electric field combined with an electric dipole field required for mass separation. The independently adjustable electric field can provide a larger optical aperture, and be used to correct astigmatism and to deflect the beam in a direction parallel and/or perpendicular to a magnetic field. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012227140(A) 申请公布日期 2012.11.15
申请号 JP20120088766 申请日期 2012.04.09
申请人 FEI CO 发明人 DAVID TUGGLE;N WILLIAM PARKER
分类号 H01J37/05;H01J37/153;H01J37/317;H01J49/10;H01J49/48 主分类号 H01J37/05
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