发明名称 PHOTOMASK
摘要 <P>PROBLEM TO BE SOLVED: To provide a photomask 1 that inclinedly emits parallel light 7 applied from an exposure device, to an irradiated body 6 and that can perform, by a single exposure, multi-angle inclined exposure to a subject 6 by a regular contact exposure device without inclining the irradiated body 6. <P>SOLUTION: The photomask includes: a pattern of a light transmission part 31 formed on an irradiation surface side of a transparent substrate; inclined planes 21 and 22 formed on a part in an emission surface side of the transparent substrate corresponding to the pattern; and further a gray scale film formed on the light transmission part. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012226129(A) 申请公布日期 2012.11.15
申请号 JP20110093949 申请日期 2011.04.20
申请人 TOPPAN PRINTING CO LTD 发明人 NAKAMURA DAISUKE;HAYASHI KOKI
分类号 G03F1/60;G03F1/54;G03F7/20 主分类号 G03F1/60
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