发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor device with reduced leakage current against reverse bias while maintaining excellent on-characteristics. <P>SOLUTION: A semiconductor device comprises: a channel formation layer composed of a nitride-based compound semiconductor; a pseudo mixed crystal layer provided on the channel formation layer and composed of a pseudo mixed crystal including a first semiconductor layer composed of a first nitride-based compound semiconductor and a second semiconductor layer composed of a second nitride-based compound semiconductor; a conductive semiconductor layer provided on the pseudo mixed crystal layer, composed of the nitride-based compound semiconductor, and having a conductivity type reverse to the conductivity type of majority carriers of the channel formation layer; a first electrode contacting the conductive semiconductor layer; and a second electrode electrically connected to the channel formation layer. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012227228(A) |
申请公布日期 |
2012.11.15 |
申请号 |
JP20110091333 |
申请日期 |
2011.04.15 |
申请人 |
ADVANCED POWER DEVICE RESEARCH ASSOCIATION |
发明人 |
IKEDA SHIGEAKI;KATO SADAHIRO |
分类号 |
H01L29/872;H01L21/338;H01L29/47;H01L29/778;H01L29/812 |
主分类号 |
H01L29/872 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|