发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor device with reduced leakage current against reverse bias while maintaining excellent on-characteristics. <P>SOLUTION: A semiconductor device comprises: a channel formation layer composed of a nitride-based compound semiconductor; a pseudo mixed crystal layer provided on the channel formation layer and composed of a pseudo mixed crystal including a first semiconductor layer composed of a first nitride-based compound semiconductor and a second semiconductor layer composed of a second nitride-based compound semiconductor; a conductive semiconductor layer provided on the pseudo mixed crystal layer, composed of the nitride-based compound semiconductor, and having a conductivity type reverse to the conductivity type of majority carriers of the channel formation layer; a first electrode contacting the conductive semiconductor layer; and a second electrode electrically connected to the channel formation layer. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012227228(A) 申请公布日期 2012.11.15
申请号 JP20110091333 申请日期 2011.04.15
申请人 ADVANCED POWER DEVICE RESEARCH ASSOCIATION 发明人 IKEDA SHIGEAKI;KATO SADAHIRO
分类号 H01L29/872;H01L21/338;H01L29/47;H01L29/778;H01L29/812 主分类号 H01L29/872
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