发明名称 METHODS FOR MANUFACTURING HIGH DIELECTRIC CONSTANT FILMS
摘要 Provided are methods for depositing a high-k dielectric film on a substrate. The methods comprise annealing a substrate after cleaning the surface to create dangling bonds and depositing the high-k dielectric film on the annealed surface.
申请公布号 WO2012154789(A2) 申请公布日期 2012.11.15
申请号 WO2012US37030 申请日期 2012.05.09
申请人 APPLIED MATERIALS, INC.;SATO, TATSUYA E.;MAHAJANI, MAITREYEE 发明人 SATO, TATSUYA E.;MAHAJANI, MAITREYEE
分类号 H01L21/31;H01L21/336;H01L21/8238;H01L29/78 主分类号 H01L21/31
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