| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a dry film resist roll suppressing bleed-out of a monomer in a photosensitive resin through a protective layer, to provide a method for forming a resist pattern on a substrate by using the dry film resist roll, and to provide use application of the resist pattern. <P>SOLUTION: The dry film resist roll comprises a photosensitive resin laminate wound on a roll core, in which the photosensitive resin laminate comprises a support (A), a photosensitive resin layer (B) and a protective layer (C), laminated in this order. The photosensitive resin layer (B) includes (a) 20 to 90 mass% of a thermosetting polymer containing a carboxyl group, (b) 5 to 75 mass% of an addition polymerizable monomer having at least one polymerizable ethylenically unsaturated bond in the molecule, and (c) 0.01 to 30 mass% of a photopolymerization initiator. The protective layer (C) comprises a propylene-based copolymer film. <P>COPYRIGHT: (C)2013,JPO&INPIT |
