发明名称 FLUX APPLICATION METHOD, MANUFACTURING METHOD OF MOUNTING SUBSTRATE, AND FLUX APPLICATION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a flux application method which sufficiently supplies flux to a region of a printed wiring board where an electronic component having high height is mounted. <P>SOLUTION: A flux application method includes: a process where a first flux application region is formed; and a process where a second flux application region is formed. In the process where the second flux application region is formed, the second flux application region is formed so as to cover the first flux application region. In the process where the second flux application region is formed, a second spray nozzle 70 moves in a direction different from a direction that a first spray nozzle 60 moves in the process where the first flux application region is formed. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012227343(A) 申请公布日期 2012.11.15
申请号 JP20110093247 申请日期 2011.04.19
申请人 MITSUBISHI ELECTRIC CORP 发明人 TANABE TAKESHI;KAWABATA RYOHEI;IDETA GORO
分类号 H05K3/34;B23K1/00;B23K3/00;B23K101/42 主分类号 H05K3/34
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