发明名称 METHOD AND APPARATUS FOR INSPECTING THREE-DIMENSIONAL DEFECT
摘要 <P>PROBLEM TO BE SOLVED: To provide a three-dimensional defect inspection apparatus which is an automatic defect inspection apparatus of a color filter substrate and is capable of performing extremely efficient defect inspection of a defect on the color filter substrate by performing not only area size determination of a plane but also simultaneously performing defect determination in a height direction. <P>SOLUTION: The three-dimensional defect inspection apparatus for simultaneously detecting defects in a plane direction and a height direction of the color filter substrate includes: conveyance means for placing the color filter substrate and conveying the color filter substrate on an XY plane; imaging means in which a camera and a light source can be synchronously and axially moved on the color filter substrate; image processing means for performing arithmetic processing of imaged data obtained by the imaging means; and means for determining acceptance of the color filter substrate by three-dimensional defect data obtained by the image processing means. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012225824(A) 申请公布日期 2012.11.15
申请号 JP20110095023 申请日期 2011.04.21
申请人 TOPPAN PRINTING CO LTD 发明人 EGAWA SHINICHI
分类号 G01N21/956;G01N21/88 主分类号 G01N21/956
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