发明名称 |
Semiconductor Device and Manufacturing Method Thereof |
摘要 |
A p channel IFT of a driving circuit has a single drain structure and its n channel TFT, a GOLD structure or an LDD structure. A pixel TFT has the LDD structure. A pixel electrode disposed in a pixel portion is connected to the pixel TFT through a hole bored in at least a protective insulation film formed of an inorganic insulating material and formed above a gate electrode of the pixel TFT, and in an interlayer insulating film disposed on the insulation film in close contact therewith. These process steps use 6 to 8 photo-masks.
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申请公布号 |
US2012286276(A1) |
申请公布日期 |
2012.11.15 |
申请号 |
US201213555468 |
申请日期 |
2012.07.23 |
申请人 |
YAMAZAKI SHUNPEI;ARAI YASUYUKI;KOYAMA JUN;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAZAKI SHUNPEI;ARAI YASUYUKI;KOYAMA JUN |
分类号 |
H01L33/08;G02F1/1362;H01L21/00;H01L21/60;H01L21/77;H01L21/84;H01L23/552;H01L23/60;H01L27/12;H01L27/146;H01L29/04;H01L29/786 |
主分类号 |
H01L33/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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