RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition that can give a resist pattern having an excellent exposure margin and a mask error factor and less generation of defects.

SOLUTION: The resist composition contains: (A1) a resin having a structural unit expressed by formula (I); (A2) a resin which is insoluble or poorly soluble with an alkali aqueous solution and can dissolve in an alkali aqueous solution by the action of an acid; (B) an acid generator; and (D) at least one compound selected from the group consisting of a compound expressed by formula (II1) and a compound expressed by formula (II2).

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