发明名称 Field Effect Transistor Device with Self-Aligned Junction and Spacer
摘要 A field effect transistor device includes a substrate including a source region, a drain region, and a channel region disposed between the source region and the drain region, wherein the source region is connected to the channel region with a source extension portion, and the drain region is connected to the channel region with a drain extension portion, a first spacer portion disposed on the source region, the drain region and a first portion of the source extension portion, and a first portion of the drain extension portion, a second spacer portion disposed on a second portion of the source extension portion, and a second portion of the drain extension portion, a gate stack portion disposed on the channel region.
申请公布号 US2012286360(A1) 申请公布日期 2012.11.15
申请号 US201213556608 申请日期 2012.07.24
申请人 GUO DECHAO;KULKARNI PRANITA;MURALIDHAR RAMACHANDRAN;YEH CHUN-CHEN;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 GUO DECHAO;KULKARNI PRANITA;MURALIDHAR RAMACHANDRAN;YEH CHUN-CHEN
分类号 H01L29/78 主分类号 H01L29/78
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